The thermally stimulated (T=20-400 degrees C) ''spontaneous'' electron
and ion emission (exoemission) from crystal and porous silicon surfac
es was investigated. The exoemission current bursts, observed from an
etched silicon surface and from a porous silicon surface as a result o
f cooling, are attributed to exothermal crystallization of a thin oxid
e layer on a ''real'' silicon surface. The exoemission bursts due td h
eating during repeated heat-cycle tests are attributed to diverse stru
ctural phase transitions in the tridymite and crystobalite modificatio
ns in a thin oxide layer. The results obtained for a real silicon surf
ace are compared to the emission current bursts from a surface oxide l
ayer obtained by oxidation of silicon at high temperature. (C) 1996 Am
erican Institute of Physics.