THE ISOLATION AND STRUCTURE OF A HIGHLY STABLE, METALATION-RESISTANT AND MULTIPLY HYDROGEN-BONDED SULFONYLAMIDE-PHOSPHINE OXIDE ADDUCT, PHSO(2)CH(2)C(=O)NH2-CENTER-DOT-O=P(NME(2))(3), PSA-CENTER-DOT-HMPA (PSA=PHENYLSULFONYLACETAMIDE, HMPA=HEXAMETHYLPHOSPHORAMIDE)
I. Cragghine et al., THE ISOLATION AND STRUCTURE OF A HIGHLY STABLE, METALATION-RESISTANT AND MULTIPLY HYDROGEN-BONDED SULFONYLAMIDE-PHOSPHINE OXIDE ADDUCT, PHSO(2)CH(2)C(=O)NH2-CENTER-DOT-O=P(NME(2))(3), PSA-CENTER-DOT-HMPA (PSA=PHENYLSULFONYLACETAMIDE, HMPA=HEXAMETHYLPHOSPHORAMIDE), Chemical communications, (2), 1996, pp. 153-154
Attempted metallations of the expectedly acidic sulfonylamide (PSA) in
the presence of the phosphine oxide HMPA all fail, giving instead the
very stable 1:1 adduct PSA . HMPA; its solid-state structure consists
of layers of PSA molecules linked by intercalated HMPA molecules, suc
h aggregation resulting in particular from a large number of significa
nt C-H ... O hydrogen-bonding interactions per PSA . HMPA unit.