Epitaxial TiO2 and Nb-doped TiO2 thin films have been grown on (110) T
iO2 rutile substrates by molecular beam epitaxy using elemental Ti and
Nb sources along with an electron cyclotron resonance oxygen plasma s
ource. Film composition was measured by X-ray photoelectron spectrosco
py. Reflection high-energy electron diffraction and low-energy electro
n diffraction patterns reveal excellent long-range crystallographic or
der and a rutile structure for both TiO2 and Nb-doped TiO2 films. The
high degree of similarity in Ti and Nb core-level X-ray photoelectron
diffraction angular distributions establishes that Nb is substitutiona
lly incorporated in the rutile lattice. Analysis of the Nb 3d(5/2) cor
e-level binding energy suggests an Nb4+ oxidation state.