A new method to obtain nearly homeotropic alignment with small pretilt
angles off the substrate normal employing vacuum oblique evaporation
of SiOx has been developed. Selected pretilt angles in the range of (0
-5) degrees can be easily obtained with this method and it is not very
sensitive to the deposition angle, angle between the substrate normal
and the direction of evaporation, or the SiOx layer thickness, giving
the flexibility of preparing very clean alignment layers on large are
a substrates. This could be useful in making high contrast liquid crys
tal light valves for projection displays and multi-domain liquid cryst
al displays.