OPTICAL-EMISSION AND MICROWAVE FIELD INTENSITY MEASUREMENTS IN SURFACE WAVE-EXCITED PLANAR PLASMA

Citation
M. Nagatsu et al., OPTICAL-EMISSION AND MICROWAVE FIELD INTENSITY MEASUREMENTS IN SURFACE WAVE-EXCITED PLANAR PLASMA, JPN J A P 2, 35(3A), 1996, pp. 341-344
Citations number
17
Categorie Soggetti
Physics, Applied
Volume
35
Issue
3A
Year of publication
1996
Pages
341 - 344
Database
ISI
SICI code
Abstract
A large-planar (22 cm diam.) high-density (similar to 2 x 10(12) cm(-3 )) plasma is produced in argon gas at 140 Pa by 2.45 GHz-1 kW discharg es, using a microwave launcher of small slot antennas. The two-dimensi onal distributions of optical emission intensities as well as microwav e field intensities are measured near the plasma surface irradiated wi th microwaves. Both the optical emission and the microwave field clear ly show stationary patterns of azimuthal mode m = 3 and radial mode n = 3 at higher pressures (140 Pa), while a mode change to m = 6 and n = 2 is observed at lower pressures (44 Pa). These patterns are attribut ed to the excitation and absorption of standing surface waves near the cutoff layer.