DYNAMIC SIMULATION OF REDEPOSITION OF BACKSCATTERED AND SPUTTERED PARTICLES ON TUNGSTEN IRRADIATED BY PLASMAS

Authors
Citation
J. Kawata et K. Ohya, DYNAMIC SIMULATION OF REDEPOSITION OF BACKSCATTERED AND SPUTTERED PARTICLES ON TUNGSTEN IRRADIATED BY PLASMAS, JPN J A P 2, 35(3A), 1996, pp. 345-348
Citations number
11
Categorie Soggetti
Physics, Applied
Volume
35
Issue
3A
Year of publication
1996
Pages
345 - 348
Database
ISI
SICI code
Abstract
Redeposition of backscattered and sputtered particles due to their ion ization and gyromotion in the scrape-off layer (SOL) is investigated u sing a dynamic simulation model of interaction of Maxwellian carbon io ns with a tungsten surface. The implantation of projectile carbon ions during their bombardment causes reduction in the amounts of sputtered tungsten and backscattered carbon ions, and it causes an additional s puttering of carbon. Due to redeposition of emitted particles on the s urface, the sputtering of tungsten (implanted carbon) is more (less) s uppressed. Furthermore, a thick carbon layer is deposited on the tungs ten surface at high SOL plasma temperatures, at which the surface is e roded if no redeposition is included in the simulation.