J. Kawata et K. Ohya, DYNAMIC SIMULATION OF REDEPOSITION OF BACKSCATTERED AND SPUTTERED PARTICLES ON TUNGSTEN IRRADIATED BY PLASMAS, JPN J A P 2, 35(3A), 1996, pp. 345-348
Redeposition of backscattered and sputtered particles due to their ion
ization and gyromotion in the scrape-off layer (SOL) is investigated u
sing a dynamic simulation model of interaction of Maxwellian carbon io
ns with a tungsten surface. The implantation of projectile carbon ions
during their bombardment causes reduction in the amounts of sputtered
tungsten and backscattered carbon ions, and it causes an additional s
puttering of carbon. Due to redeposition of emitted particles on the s
urface, the sputtering of tungsten (implanted carbon) is more (less) s
uppressed. Furthermore, a thick carbon layer is deposited on the tungs
ten surface at high SOL plasma temperatures, at which the surface is e
roded if no redeposition is included in the simulation.