ON THE LOW-RESISTANCE AU GE/PD OHMIC CONTACT TO N-GAAS/

Citation
Ph. Hao et al., ON THE LOW-RESISTANCE AU GE/PD OHMIC CONTACT TO N-GAAS/, Journal of applied physics, 79(8), 1996, pp. 4211-4215
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
79
Issue
8
Year of publication
1996
Part
1
Pages
4211 - 4215
Database
ISI
SICI code
0021-8979(1996)79:8<4211:OTLAGO>2.0.ZU;2-N
Abstract
We report that a Au/Ge/Pd layered structure can result in low contact resistivities (similar to 10(-6) Omega cm(2)) to n-GaAs processed in t hree temperature ranges (175-200, 340-350, and 425-450 degrees C). The contacts processed below the Au-Ge eutectic temperature (361 degrees C) show good surface and interface morphology, thermal stability, Au w ire bondability, and reproducibility. The ohmic contact formation mech anisms are also presented. (C) 1996 American Institute of Physics.