SYSTEMATIC STUDY ON STRUCTURAL AND DIELECTRIC-PROPERTIES OF LEAD ZIRCONATE TITANATE (PB,LA)(ZR(1-X)TI(X))O-3 THIN-FILMS DEPOSITED BY METALLOORGANIC DECOMPOSITION TECHNOLOGY/
W. Zhu et al., SYSTEMATIC STUDY ON STRUCTURAL AND DIELECTRIC-PROPERTIES OF LEAD ZIRCONATE TITANATE (PB,LA)(ZR(1-X)TI(X))O-3 THIN-FILMS DEPOSITED BY METALLOORGANIC DECOMPOSITION TECHNOLOGY/, Journal of applied physics, 79(8), 1996, pp. 4283-4290
Pin-hole free ferroelectric (Pb,La)(Zr1-xTix)O-3 thin films with unifo
rm composition have been fabricated using the metallo-organic precurso
r compounds, which were carefully home synthesized. The structural dev
elopment, spectroscopic, and dielectric properties of these films have
been systematically investigated using atomic force microscopy (AFM),
x-ray diffraction, Fourier transform infrared spectroscopy, Raman sca
ttering, and dielectric measurements. It has been found from our exper
imental results of PZT 40/60 thin films that the overlapping of (h00)
and (00l) peaks of these films in x-ray diffraction patterns, mainly d
ue to the small grain sizes in films, makes it very difficult to disti
nguish individual diffraction peaks and to identify the phases. Howeve
r, Raman measurements undoubtedly reveal the Raman spectra of these fi
lms in the tetragonal phase field, demonstrating that Raman spectrosco
py is an effective tool to identify structures, especially in the case
of thin films having very small grains. AFM results show that the PZT
perovskite structure in films may grow radially by rosettes and that
microcracks appear in the three-dimensional AFM pictures at grain boun
daries, which may be the cause for easy dielectric breakdown. A striki
ng feature of the AFM observation is that three polycrystalline perovs
kite regions intersect symmetrically at a point with 120 degrees to ea
ch other, and a rosette growth model for the perovskite structure in P
ZT films is thus proposed to explain this new phenomenon. The excellen
t ferroelectric properties of these films, such as the high fatigue re
sistance and low leakage current, are attributed to the high quality o
f the metallo-organic solutions and to reduce the amount of oxygen vac
ancies in the films by optimizing the annealing conditions and by dopi
ng a suitable amount of La ions to minimize the charge blocking of oxy
gen vacancy at the interface by Pt electrode. It seems that the rhombo
hedral PZT films with softer hysteresis loops are suitable for nonvola
tile random access memory application. (C) 1996 American Institute of
Physics.