SURFACE OXIDATION AND REDUCTION OF CUO AND CU2O STUDIED USING XPS ANDXAES

Citation
S. Poulston et al., SURFACE OXIDATION AND REDUCTION OF CUO AND CU2O STUDIED USING XPS ANDXAES, Surface and interface analysis, 24(12), 1996, pp. 811-820
Citations number
29
Categorie Soggetti
Chemistry Physical
ISSN journal
01422421
Volume
24
Issue
12
Year of publication
1996
Pages
811 - 820
Database
ISI
SICI code
0142-2421(1996)24:12<811:SOAROC>2.0.ZU;2-0
Abstract
Using XPS and x-ray-excited Auger electron spectroscopy (XAES), we hav e studied the variation in surface composition of CuO and Cu2O with a variety of high-vacuum treatments, including vacuum annealing, oxidati on and hydrogen reduction. Prolonged annealing of CuO results in the f ormation of a thick layer of Cu2O at the surface whilst vacuum anneali ng of Cu2O produces a thin (possibly one monolayer) film of Cu metal. Both bulk Cu2O and the thick Cu2O film generated from vacuum-annealed CuO were oxidized to CuO by heating at 800 K in 1 x 10(-4) mbar O-2, t he original surface being regenerated with vacuum annealing at the sam e temperature. Both CuO and Cu2O are reduced to metal at the surface b y heating in 1 x 10(-4) mbar hydrogen at 400 K. In the case of CuO, th e extent of reduction varies with the thermal history of the sample, w ith prolonged vacuum annealing producing a more reducible surface. Hyd rogen-reduced CuO and Cu2O were both reoxidized on vacuum annealing, d emonstrating the diffusion of lattice oxygen to the surface.