Ch. Lai et al., EXPLORATION OF MAGNETIZATION REVERSAL AND COERCIVITY OF EPITAXIAL NIO(111) NIFE FILMS/, Journal of applied physics, 79(8), 1996, pp. 6389-6391
We have grown epitaxial NiO {111} films of thicknesses ranging from 60
to 1200 Angstrom, deposited 45 Angstrom NiFe films on these NiO subst
rates, and made measurements of exchange field and coercivity, of the
effective uniaxial anisotropy, of rotational hysteresis, and of the tr
aining effect on these films. We find that the large coercive fields,
similar to 500 Oe, observed in these epitaxial systems can be understo
od using a model in which the magnetization reversal process is by rot
ation, with the coercive field determined by the effective uniaxial an
isotropy of the system. This effective anisotropy is in turn determine
d by the anisotropy of the NiO and depends on NiO thickness. (C) 1996
American Institute of Physics.