HALL-EFFECT CHARACTERIZATION IN SEMICONDUCTOR HETEROSTRUCTURE JUNCTIONS USING POLARIZED LASER SIGNAL

Citation
H. How et al., HALL-EFFECT CHARACTERIZATION IN SEMICONDUCTOR HETEROSTRUCTURE JUNCTIONS USING POLARIZED LASER SIGNAL, Journal of applied physics, 79(8), 1996, pp. 4759-4761
Citations number
5
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
79
Issue
8
Year of publication
1996
Part
2A
Pages
4759 - 4761
Database
ISI
SICI code
0021-8979(1996)79:8<4759:HCISHJ>2.0.ZU;2-J
Abstract
We describe a new technique which exploits the ac Hall effect in the c haracterization of layered semiconductor structures. The method employ s laser signals in the presence of a de magnetic bias field. Upon inci dence the polarization of the optical signal is rotated via a Lorentz force due to the ac Hall effect. As such, the reflected waves carry in formation on the Hall mobility of the charge carriers. The calculation s show that ac Hall reflection warrants sufficient intensity to be mea sured. Our theory is complete in the sense that depth profiling has be en explicitly incorporated in the formulation. (C) 1996 American Insti tute of Physics.