THERMODYNAMIC CONSIDERATION OF SI-N AND SI-H-N SYSTEMS FOR SILICON-NITRIDE POWDER PRODUCTION IN THERMAL PLASMA

Authors
KOSTIC ZG STEFANOVIC PL PAVLOVIC PB
Citation
Zg. Kostic et al., THERMODYNAMIC CONSIDERATION OF SI-N AND SI-H-N SYSTEMS FOR SILICON-NITRIDE POWDER PRODUCTION IN THERMAL PLASMA, Ceramics international, 22(3), 1996, pp. 179-186
Citations number
15
Categorie Soggetti
Material Science, Ceramics
Journal title
Ceramics international → ACNP
ISSN journal
02728842
Volume
22
Issue
3
Year of publication
1996
Pages
179 - 186
Database
ISI
SICI code
0272-8842(1996)22:3<179:TCOSAS>2.0.ZU;2-6
Abstract
The results of equilibrium composition and total enthalpy computation in the temperature range of 1000-6000 K and at 1 bar for Si-N and Si-H -N systems are presented in the paper. These data enable temperature a nd energy parameters determination and optimization of the process for ultrafine silicon nitride powder production, in which silicon powder evaporation in a nitrogen thermal plasma is followed by quenching with nitrogen or ammonia.