Zg. Kostic et al., THERMODYNAMIC CONSIDERATION OF SI-N AND SI-H-N SYSTEMS FOR SILICON-NITRIDE POWDER PRODUCTION IN THERMAL PLASMA, Ceramics international, 22(3), 1996, pp. 179-186
The results of equilibrium composition and total enthalpy computation
in the temperature range of 1000-6000 K and at 1 bar for Si-N and Si-H
-N systems are presented in the paper. These data enable temperature a
nd energy parameters determination and optimization of the process for
ultrafine silicon nitride powder production, in which silicon powder
evaporation in a nitrogen thermal plasma is followed by quenching with
nitrogen or ammonia.