LASER-INDUCED SELECTIVE DEPOSITION OF NIC KEL ON P-TYPE SILICON

Selective deposition of thin nickel films on p-type silicon was obtain ed in a hydrazine-based conventional electroless nickel plating soluti on at the ambient temperature under laser irradiation, Composition and properties of the deposits were investigated using SEM, AES and RES t echniques, The deposits are in Schottky barrier contact with p-type si licon, The mechanism involved in the deposition process was also discu ssed.