Mo5S3 shows high creep resistance but poor high temperature oxidation
resistance. Previous work has shown that the oxidation rate of Mo5Si3
can be decreased with the addition of boron. By adding 1 3 wt % boron
to a silicon deficient composition, a three phase microstructure compo
sed of Mo5Si3 (T1), Mo5Si3, and a ternary Mo-5(Si,B)3 (T2) phase was s
ynthesized. The compressive creep rate of this composition was evaluat
ed at 1240-1320 degrees C and 120-180 MPa. The average creep stress ex
ponent and activation energy for the three phase material were found t
o be n = 4.3 and E(a) = 396 kJ/mol. TEM analysis of the crept microstr
ucture of the boron modified material reveals no evidence for dislocat
ion activity in T1. Only basal slip was observed in the T2 phase while
polygonal sub-grain structures were observed in Mo3Si. (C) 1996 Elsev
ier Science Ltd.