PROPERTIES OF CARBON ION DEPOSITED TETRAHEDRAL AMORPHOUS-CARBON FILMSAS A FUNCTION OF ION ENERGY

Ion energy, controlled by the substrate bias, is an important paramete r in determining properties of films deposited by the filtered cathodi c vacuum are technique. The substrate bias determines the ion energy d istribution of the growth species. The ion energy is varied, while kee ping the other deposition conditions constant, in order to study the e ffect of ion energy on the film properties. The films were characteriz ed by their optical and mechanical parameters using an ellipsometer, s urface profilometer, optical spectrometer, and nanoindenter. Electron energy-loss spectroscopy and Raman spectroscopy were used for structur al analysis of the films. (C) 1996 American Institute of Physics.