IMPACT OF BIAS VOLTAGE ON FURNACE ATOMIZATION PLASMA EMISSION-SPECTROMETRY PERFORMANCE

Citation
Re. Sturgeon et al., IMPACT OF BIAS VOLTAGE ON FURNACE ATOMIZATION PLASMA EMISSION-SPECTROMETRY PERFORMANCE, Spectrochimica acta, Part B: Atomic spectroscopy, 48(6-7), 1993, pp. 893-908
Citations number
14
Categorie Soggetti
Spectroscopy
ISSN journal
05848547
Volume
48
Issue
6-7
Year of publication
1993
Pages
893 - 908
Database
ISI
SICI code
0584-8547(1993)48:6-7<893:IOBVOF>2.0.ZU;2-C
Abstract
The effects of an applied d.c. bias potential on the analytical respon se from a furnace atomization plasma emission spectrometry (FAPES) sou rce operating with a 50 W He plasma were investigated. Enhancements in absolute sensitivity and detection limits for B, Cd, Pb, Ni, Fe, S, P t and Se ranged from 2-10-fold as compared to the usual ''free running '' self-bias situation and response from all species was enhanced as t he applied bias was made more negative. Reflected power increases up t o 35 W exert little effect on the excitation conditions within the pla sma. The excitation temperature of the He support gas as well as that of Fe introduced as a thermometric species indicated that, while the t emperature of the former varied by up to 700 K over the course of an a tomization transient, that of Fe remained relatively stable. Bias cont rol reduced the fluctuation in the He temperature to under 400 K.