Le. Fleck et al., GENERATION OF RADICALS ON A METAL-SURFACE FROM PHOTOINDUCED DISSOCIATION OF PHYSISORBED MOLECULES - CH2 FROM H2CO ON AG(111), Journal of physical chemistry, 100(19), 1996, pp. 8011-8014
Submonolayer formaldehyde (H2CO) has been photodissociated on Ag(111)
at 35 K using nanosecond 287 nm laser pulses. The low temperature proh
ibits further bimolecular reactions of the dissociation products and a
llows their analysis by electron energy loss spectroscopy. One of the
dissociation products has been identified as the radical species methy
lene (CH2). The dissociation is induced by photoexcited substrate elec
trons attached to formaldehyde, forming a transient formaldehyde negat
ive ion that dissociates. Due to the influence of adsorbate-substrate
bonding on reaction energetics, the dissociation channel of H2CO- on A
g appears to be different from that of the gaseous negative ion.