STUDY OF QUANTUM-WELL WIRES OF DIFFERENT WIDTHS PRODUCED BY REACTIVE ION ETCHING AND ANODIC-OXIDATION

Citation
Fn. Timofeev et al., STUDY OF QUANTUM-WELL WIRES OF DIFFERENT WIDTHS PRODUCED BY REACTIVE ION ETCHING AND ANODIC-OXIDATION, Semiconductor science and technology, 11(5), 1996, pp. 801-804
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
11
Issue
5
Year of publication
1996
Pages
801 - 804
Database
ISI
SICI code
0268-1242(1996)11:5<801:SOQWOD>2.0.ZU;2-M
Abstract
We have fabricated AlGaAs/GaAs quantum well wires (QWW) with various l ateral widths down to 20 nm by anodic oxidation of a 100 nm QWW initia lly produced by low-energy reactive ion etching. The wires were studie d by photoluminescence spectroscopy at 77 K. The expected blue shift o f the PL energy was observed as the QWW width was reduced, reaching 16 meV for 20 nm wires. The decrease of the PL signal from the QWW was o nly a factor of two for a five times reduction in the QWW width.