NOVEL IN-LINE APPLICATIONS OF ATOMIC-FORCE MICROSCOPY

The critical dimension atomic force microscope (CD-AFM), with its abil ity to provide precise linewidth, thickness, and sidewall profile data , promises to contribute to many aspects of process development and pr oduction. Linewidth measurements made by the CD-AFM correlate well wit h those made by other systems generally used to measure submicron line widths. Several unique applications for in-line inspection and metrolo gy are demonstrated, illustrating the roles this tool may play inside the fab. The limitations of current CD-AFMs (including low throughput, poor tip stability, and inadequate automation capabilities) are also discussed.