MOLECULAR SIMULATION OF THERMAL-DESTRUCTI ON PROCESSES IN ALUMINOPHOSPHATES

Citation
H. Yamano et al., MOLECULAR SIMULATION OF THERMAL-DESTRUCTI ON PROCESSES IN ALUMINOPHOSPHATES, Kagaku kogaku ronbunshu, 21(6), 1995, pp. 1140-1146
Citations number
28
Categorie Soggetti
Engineering, Chemical
Journal title
ISSN journal
0386216X
Volume
21
Issue
6
Year of publication
1995
Pages
1140 - 1146
Database
ISI
SICI code
0386-216X(1995)21:6<1140:MSOTOP>2.0.ZU;2-2
Abstract
The thermal destruction process oi AlPO4-5 and VPI-5 was investigated by using molecular dynamics and computer graphic methods. The mobility of atoms in AlPO4-5 was increased and the framework became unstable a s the temperature increased. Finally the framework transformed into an amorphous phase. During this process, bonds between Al and O were fre quently broken or formed, P-O bonds were, however, scarcely changed. T his indicates that the Al-O bond in the framework is weaker than the P -O bond. AlPO4-5 has only one T (T=Al or P) site, whereas three crysta llographically distinct T sites are located in VPI-5. Thus, we also in vestigated dynamic differences between Al atoms located in distinct T sites during the thermal destruction process of VPI-5. It was found th at Al-O bonds formed by Al atoms at the T1 site are most apt to be bro ken.