DICHROIC MIRROR DESIGN BY COMPLETE ADMITTANCE MATCHING

The application of a new admittance-matching method to the design of d ichroic mirrors is presented. The method is based on the alteration of both thicknesses involved in the symmetrical period of the matching s tack and provides the complete matching at the desired wavelength, i.e ., both conditions for the equivalent admittance and phase thickness a re fulfilled. A supplementary condition, stated for the derivative of the equivalent admittance with respect to the wavelength, produces a q uasi-matching over a wide spectral range. A detailed description of th e algorithm used by the computer program that performs this matching i s given. (C) 1996 Society of Photo-Optical instrumentation Engineers.