We report on the construction and study of a high-repetition-rate doub
le-discharge electron beam generator. A synergetic superposition of a
pulsed discharge on a continuous one is used to generate an intense el
ectron beam (tens of kilo-electron-volts and hundreds of amperes) that
might be used as a useful and inexpensive tool for many applications
such as laser generation, x-ray generation, photochemistry, material d
eposition, and others. To increase the average power the repetition ra
te is increased in different discharge configurations. Two types of hi
gh-voltage switches are used: an electromechanical switch working up t
o 100 Hz and a thyratron-based switch operating up to 10 kHz. A limit
of 714 Hz is found for generator operation at 0.1 I/min flow speed and
pulse voltage of about 12 kV in air. (C) 1996 Society of Photo-Optica
l Instrumentation Engineers.