GROWTH OF FLUOROCARBON POLYMER THIN-FILMS WITH HIGH CF2 FRACTIONS ANDLOW DANGLING BOND CONCENTRATIONS BY THERMAL CHEMICAL-VAPOR-DEPOSITION

Thermal chemical vapor deposition was used to deposit fluorocarbon fil ms with chemical resemblance to bulk polytetrafluoroethylene. X-ray ph otoelectron spectroscopy revealed that the films deposited from therma l decomposition of hexafluoropropylene oxide had fluorine to carbon ra tios of 2.0 and CF2 fractions of 90% along with 10% of CF3 and CF moie ties. Electron spin resonance results found the dangling bond density to be 1.2x10(18) spins/cm(3), low compared to conventional plasma poly merized films. Low dangling bond densities were achieved by using a cl ean source of CF2 in the absence of plasma source. (C) 1996 American I nstitute of Physics.