We report the characterization of FeSix (x similar to 3) thin film pre
pared by simultaneous electron beam evaporation of Fe and Si onto a be
ta-FeSi2 template at 250 degrees C. The in situ reflective high energy
electron diffraction observation and ex situ cross-section transmissi
on electron microscope characterization of the as-deposited him imply
that the as-deposited film has the structure similar to that of beta-F
eSi2. But the spreading resistance measurement shows that the film is
metallic. Auger electron spectroscopy suggests that the chemical envir
onment of Fe atoms in the as-deposited FeSix film is different from th
at in the annealed him (beta-FeSi2 film). We explain this paradox by a
ssuming that the as-deposited film has the crystal lattice similar to
beta-FeSi2 but with ingredient disorder due to the low transport visco
sity of Fe and Si atoms at this temperature. (C) 1996 American Institu
te of Physics.