CHARACTERIZATION OF FESIX FILM BY CODEPOSITION ON BETA-FESI2 TEMPLATE

Citation
Xd. Chen et al., CHARACTERIZATION OF FESIX FILM BY CODEPOSITION ON BETA-FESI2 TEMPLATE, Applied physics letters, 68(20), 1996, pp. 2858-2860
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
20
Year of publication
1996
Pages
2858 - 2860
Database
ISI
SICI code
0003-6951(1996)68:20<2858:COFFBC>2.0.ZU;2-X
Abstract
We report the characterization of FeSix (x similar to 3) thin film pre pared by simultaneous electron beam evaporation of Fe and Si onto a be ta-FeSi2 template at 250 degrees C. The in situ reflective high energy electron diffraction observation and ex situ cross-section transmissi on electron microscope characterization of the as-deposited him imply that the as-deposited film has the structure similar to that of beta-F eSi2. But the spreading resistance measurement shows that the film is metallic. Auger electron spectroscopy suggests that the chemical envir onment of Fe atoms in the as-deposited FeSix film is different from th at in the annealed him (beta-FeSi2 film). We explain this paradox by a ssuming that the as-deposited film has the crystal lattice similar to beta-FeSi2 but with ingredient disorder due to the low transport visco sity of Fe and Si atoms at this temperature. (C) 1996 American Institu te of Physics.