Je. Ambler et Rj. Pinney, POST-UV SURVIVAL OF ESCHERICHIA-COLI STRAINS CARRYING MORE THAN ONE UV-SENSITIZING PLASMID, Mutation research, 351(2), 1996, pp. 181-186
The post-UV phenotypes conferred by wild-type plasmids R391 and pYD1,
which increase UV-induced mutagenesis but sensitise Escherichia coli A
B1157 umuC(+) uvrB(+) to UV, were compared, alone and in combination w
ith that of plasmid pGW16, which sensitises AB1157 to low, but protect
s against high UV doses. All three plasmids increased UV resistance wh
en present in Shigella sonnei. No plasmid significantly affected the U
V sensitivity of E. coli TK501 umuC uvrB, in which pKM101, the parent
of pGW16 increases UV resistance up to 1000-fold. Both pYD1 and R391 r
educed the UV protective effect of pKM101, and increased W-sensitisati
on conferred by pGW16. W-sensitisation conferred by pYD1 and R391 was
additive when the plasmids were together in strain AB1157, and both pK
M101 and pGW16 reduced this additive sensitisation.