Hk. Lin et X. Wu, BEHAVIOR OF ANTIMONY(III) DURING COPPER ELECTROWINNING IN CHLORIDE SOLUTIONS, Metallurgical and materials transactions. B, Process metallurgy and materials processing science, 27(2), 1996, pp. 157-162
Citations number
10
Categorie Soggetti
Material Science","Metallurgy & Metallurigical Engineering
Contamination of cathodic copper by Sb during electrowinning in chlori
de solutions is a surface phenomenon. A digitized scanning electron mi
croscopy (SEM) micrograph indicates that the Sb is concentrated on the
surface of the cathode. Energy-dispersive X-ray (EDX) analysis reveal
s that the Sb-containing layer is a complex salt of Cu, Sb, Cl, and O.
Electrochemical measurements show that the adsorption of Sb or Cu spe
cies decreases with the increase of acidity of the solution when the s
olution contains antimony chloride or cuprous chloride. The adsorption
increases with the increase of the acidity when the solution contains
both Sb and Cu. The discharge of cuprous ions in the adsorbed complex
salt releases antimonious ions and then forms a new layer Of the comp
lex salt with cuprous ions from the solution. This newly formed comple
x salt is readsorbed on the surface of the cathode. Thus, Sb concentra
tes on the surface of the cathode instead of being evenly distributed
throughout the copper product. This suggested mechanism also explains
the fact that the presence of Sb in the electrolyte enhances the elect
rodeposition of Cu.