MODELING OF PLUME DYNAMICS IN LASER-ABLATION PROCESSES FOR THIN-FILM DEPOSITION OF MATERIALS

Citation
Jn. Leboeuf et al., MODELING OF PLUME DYNAMICS IN LASER-ABLATION PROCESSES FOR THIN-FILM DEPOSITION OF MATERIALS, Physics of plasmas, 3(5), 1996, pp. 2203-2209
Citations number
14
Categorie Soggetti
Phsycs, Fluid & Plasmas
Journal title
ISSN journal
1070664X
Volume
3
Issue
5
Year of publication
1996
Part
2
Pages
2203 - 2209
Database
ISI
SICI code
1070-664X(1996)3:5<2203:MOPDIL>2.0.ZU;2-P
Abstract
The transport dynamics of laser-ablated neutral/plasma plumes are of s ignificant interest for film growth by pulsed-laser deposition of mate rials, since the magnitude and kinetic energy of the species arriving at the deposition substrate are key processing parameters. Dynamical c alculations of plume propagation in vacuum and in background gas have been performed using particle-in-cell hydrodynamics, continuum gasdyna mics, and scattering models. Results from these calculations are prese nted and compared with experimental observations. (C) 1996 American In stitute of Physics.