INSTRUMENTAL TECHNIQUES FOR THE SURFACE-ANALYSIS OF MATERIALS

Surface analysis can be defined as the direct measurement of the chemi stry of the outer few atomic layers of a solid. The most commonly-used techniques include Auger electron spectroscopy (AES), X-ray photoelec tron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS) alt hough others provide complementary information and are used in more ex tensive studies. The aforementioned techniques can be extended by the use of depth profiling methods, to obtain information from beneath the immediate surface, for example, to determine the thickness and compos ition of overlayers. Surface analytical techniques can provide valuabl e information in such areas of technology as semiconductors, packaging , catalysis, coatings and metallurgy. In this short review, an introdu ction will he given to the principles underlying AES, XPS and SIMS. Th is is followed by a number of case studies which highlight how such te chniques can elucidate a number of materials related problems.