A. Hoffman et Pjk. Paterson, SURFACE AND SUBSURFACE 1-KEV ELECTRON-STIMULATED REDUCTION OF SAPPHIRE STUDIED BY ELECTRON-SPECTROSCOPY, Applied surface science, 93(4), 1996, pp. 301-308
Citations number
23
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Electron irradiation may change the surface composition of solids by e
lectron stimulated processes. In particular sapphire, alpha-Al2O3, is
likely to be vulnerable to these processes because of the large differ
ence in electronegativity between the cation and anion. In the present
work the effect of 1 keV electron irradiation on the near surface com
position of sapphire was studied. The use of the whole range of the el
ectron spectrum produced by 1 keV primary electrons has provided a det
ailed picture of the variation with depth and electron dose of the sur
face and near surface of electron irradiated alpha-Al2O3(1000). Electr
on irradiation doses were in the range of 0.7 to 26 C/cm(2). After a d
ose of about 1 C/cm(2) sufficiently large clusters of aluminium were p
roduced to allow the generation of the Al(LVV) 67 eV Auger peak, while
after about 8 C/cm(2) the collective excitations surface and bulk pla
smons were generated, An equilibrium in the composition of the first n
anometre depth of the surface is reached after a dose of about 6 C/cm(
2), with 50% of the aluminium in alumina being reduced to the metallic
form, After a dose of about 13 C/cm(2), the composition of the first
2 nm reaches equilibrium, while deeper alumina continues to be reduced
.