Cl. Chen et al., SELF-ALIGNED COMPLEMENTARY GAAS MISFETS USING A LOW-TEMPERATURE-GROWNGAAS GATE INSULATOR, Electronics Letters, 32(4), 1996, pp. 407-409
GaAs complementary metal insulator semiconductor field effect transist
ors (MISFETs) with a low temperature grown GaAs gate insulator were fa
bricated using the same epitaxial layer structure. Self-aligned Si and
Be implants were used for the source/drain region in n- and p-channel
MISFETs, respectively. With a 1.5 mu m gate length, the maximum drain
current is 40 and 120 mA/mm for a normally-off n- and p-channel MISFE
T, respectively. It increases to 500 mA/mm for a normally-on n-channel
device.