XE POSTIRRADIATION EFFECTS IN THE THERMAL EVOLUTION AND DIFFUSION OF ER-IMPLANTED LINBO3

The modifications in the chemical and physical properties of Er+-impla nted LiNbO3 were determined by Channeling Rutherford Backscattering (R BS-C) and X-ray photoelectron spectroscopy (XPS). Thermal treatments p erformed in the temperature range 900-1100 degrees C for 2 h have effi ciently induced both the recrystallization of the host lattice and erb ium diffusion. In order to investigate the damage effect in the diffus ion process some samples were post-irradiated with Xe++ ions at 3.0 me V and subsequently annealed in the same temperature range. RBS results show that the amorphous layer induced by Xe-irradiations enhances the erbium diffusion in depth of the LiNbO3. XPS measurements show that t he niobium oxidation state is highly modified by erbium implantation.