MECHANISM FOR ANNEAL-INDUCED INTERFACIAL CHARGING IN SIO2 THIN-FILMS ON SI

H-induced positive charging is observed at both the top Si/SiO2 and bo ttom SiO2/Si interfaces in Si/SiO2/Si structures. The response of the H Induced positive charge to thermal annealing and electron injection is very different from that of simple oxygen vacancy hole traps in SiO 2. To explain this H-induced positive charging, we propose a scheme in which H reacts to form positively charged over-coordinated oxygen cen ters in close proximity to both top and bottom interfaces. The anneali ng-induced entity may also provide a natural explanation for the origi n of the fixed oxide charge that forms during oxidation of Si. (C) 199 6 American Institute of Physics.