ATOMISTIC SIMULATION OF POINT-DEFECTS IN SILICON AT HIGH-TEMPERATURE

Citation
T. Sinno et al., ATOMISTIC SIMULATION OF POINT-DEFECTS IN SILICON AT HIGH-TEMPERATURE, Applied physics letters, 68(21), 1996, pp. 3028-3030
Citations number
26
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
21
Year of publication
1996
Pages
3028 - 3030
Database
ISI
SICI code
0003-6951(1996)68:21<3028:ASOPIS>2.0.ZU;2-E
Abstract
The Stillinger-Weber interatomic potential is used in molecular dynami cs simulations to compute estimates of the equilibrium and transport p roperties of self-interstitials and vacancies in crystalline silicon a t high temperature. Equilibrium configurations are predicted as a (110 ) dumbbell for a self-interstitial, and as an inwardly relaxed configu ration for a vacancy. Both structures show considerable delocalization with increasing temperature, which leads to a strong temperature depe ndence of the entropy of formation, as suggested by diffusion experime nts. Diffusion coefficients and mechanisms are predicted as a function of temperature. The predictions are discussed in the context of exper iments and first-principle calculations. (C) 1996 American Institute o f Physics.