F. Didier et J. Jupille, CONTRIBUTION OF THE VAN-DER-WAALS FORCES TO THE WORK OF ADHESION AT METAL OXIDE INTERFACES/, Journal of adhesion science and technology, 10(4), 1996, pp. 373-382
The van der Waals contribution to the work of adhesion at metal/oxide
interfaces is analytically derived within the framework of a dielectri
c continuum model. Calculated estimates are shown to reproduce nicely
the trends deduced from measurements of the overall adhesion energy, i
ndicating that van der Waals forces play a significant role in the adh
esion mechanism. The relative contribution of the van der Waals intera
ction in the work of adhesion is discussed and is shown to be possibly
important when low-density metals and large band-gap oxides are conce
rned.