Lb. Zhang et al., SURFACE MODIFICATION OF POROUS SILICON BY ALUMINUM ISOPROPOXIDE AND ITS IMPACT ON ELECTROLUMINESCENCE, Journal of the Electrochemical Society, 143(4), 1996, pp. 1390-1394
Dilute solutions of aluminum isopropoxide have been used to modify the
surface of porous Si in an attempt to find simple chemical approaches
to stabilize its electroluminescent response and simultaneously provi
de additional details concerning the mechanism of electroluminescence
degradation. Both infrared and energy dispersive x-ray spectroscopies
confirm that aluminum is incorporated onto the porous Si surface. The
modified porous Si has much more stable electroluminescence at lower b
ias voltages, and the rate of electroluminescence degradation is very
sensitive to the surface temperature. The surface temperature, in turn
, is clearly a function of applied bias voltage. Transmission electron
microscopy and infrared spectroscopic measurements clearly demonstrat
e that the degradation is related to Si nanoparticle oxidation. By inv
estigating the degradation rate of porous Si electroluminescence at di
fferent temperatures, the activation energy of porous Si oxidation can
be estimated.