CONTROL OF PLASMA PARAMETERS IN SHEET-SHAPED ELECTRON-CYCLOTRON-RESONANCE HEATING PLASMA SUPPLEMENTED WITH RADIO-FREQUENCY DISCHARGE

Production and parameter control techniques of sheet-shaped electron c yclotron resonance heating (ECRH) plasma are described. When rf power (f congruent to 13.56 MHz) is supplemented by the sheet-shaped ECR pla sma, the ion temperature, T-i, ion fluxes, n(b)/n(o), and high energy component, epsilon(i), of ions deposited to the substrate can be contr olled arbitrarily within the range of 0.3 eV less than or equal to T-i less than or equal to 10.0 eV, 0 less than or equal to n(b)/n(o) less than or equal to 30%, and 0 less than or equal to epsilon(i) less tha n or equal to 60 eV, respectively, in the neutral Ar gas pressure, 4x1 0(-4)less than or equal to p less than or equal to 3x10(-3) Torr. Furt hermore, the ion energy and/or the ion flux flowing onto the substrate could be well controlled by changing the bias voltage supplied to the substrate holder. We can expect that the present experimental techniq ue could be applied to the material processing in a well-defined manne r. (C) 1996 American Institute of Physics.