DEPOSITION, EVALUATION AND APPLICATION OF SPUTTERED ZINC-OXIDE THIN-FILMS

Citation
B. Wacogne et al., DEPOSITION, EVALUATION AND APPLICATION OF SPUTTERED ZINC-OXIDE THIN-FILMS, International journal of optoelectronics, 10(1), 1995, pp. 9-18
Citations number
19
Categorie Soggetti
Engineering, Eletrical & Electronic",Optics
ISSN journal
09525432
Volume
10
Issue
1
Year of publication
1995
Pages
9 - 18
Database
ISI
SICI code
0952-5432(1995)10:1<9:DEAAOS>2.0.ZU;2-P
Abstract
We discuss the production of oriented zinc oxide piezoelectric thin fi lms grown by RF magnetron sputtering, and film evaluation techniques. In particular, we present a simple interferometric method for in situ and simultaneous measurement of film thickness and optical losses. We also show that due to plasma heating, the increase in substrate temper ature at the beginning of the film growth leads to a varying film stru cture, causing a discrepancy between the expected and the observed res onant frequency of the films. We conclude this paper by presenting exp erimental results of acousto-optic interaction.