F. Ares et al., OPTIMIZATION OF APERTURE DISTRIBUTIONS FOR DIFFERENCE PATTERNS, Journal of electromagnetic waves and applications, 10(3), 1996, pp. 383-402
A design method previously developed to give distributions with a mini
mal edge brightening for sum patterns with arbitrary sidelobe topograp
hy is shown to be applicable to difference patterns as well. The metho
d is based on obtaining some null-filling in the desired pattern that
provides a multiplicity of solutions, some of which may be smoother th
an that corresponding to the pattern with deep nulls. The improvement
in the aperture distributions, for linear and planar array synthesis,
is found to be very good with the resulting loss in directivity being
small.