A SYSTEM FOR THE SUBMICRON CHARACTERIZATION OF SOLIDS

A system for the ion modification of microstructures and characterizin g materials on a microscopic scale using the mass spectrometry of seco ndary ions is described. The facility consists of a column that shapes a submicron ion beam and an analytical section including collecting o ptics with an energy filter, systems for ion transportation, focusing, and steering the secondary beam, and an MKh7304A mass spectrometer. A system for detecting both positive and negative secondary ions using a monopole mass spectrometer has been designed. The parameters of the facility's operation are monitored and controlled by an IBM PC/AT 486 computer via a dedicated SIMSCAN system. Examples of the facility oper ation, such as records of the mass spectra, depth profiles, and two-di mensional patterns of solids are given.