GLOW-DISCHARGE SPUTTERING DEPOSITION OF THIN-FILMS OF AG, CR, CU, NI,PD, RH AND THEIR BINARY-ALLOYS ONTO NACL AND MGO EXPERIMENTAL PARAMETERS AND EPITAXY

Authors
RENIERS F DELPLANCKE MP ASSKALI A ROORYCK V VANSINAY O
Citation
F. Reniers et al., GLOW-DISCHARGE SPUTTERING DEPOSITION OF THIN-FILMS OF AG, CR, CU, NI,PD, RH AND THEIR BINARY-ALLOYS ONTO NACL AND MGO EXPERIMENTAL PARAMETERS AND EPITAXY, Applied surface science, 92, 1996, pp. 35-42
Citations number
22
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
92
Year of publication
1996
Pages
35 - 42
Database
ISI
SICI code
0169-4332(1996)92:<35:GSDOTO>2.0.ZU;2-O
Abstract
The experimental conditions to condense epitaxial films of Ag, Cr, Cu, Ni, Pd, Rh, AgPd, CuPd and CuRh on MgO(100) and NaCl(100) by glow dis charge sputtering are reported. The films are characterized by THEED, RHEED, SAD, TEM, ICP and AES. The effect of the substrate, the tempera ture and the target composition on the films obtained is examined and discussed. perfect parallel epitaxy ((001)[110](d) parallel to(100)[11 0](s)) was observed for all systems studied, except for Ag/MgO.