DIAMOND-LIKE COATING PREPARED BY PULSED-LASER SPUTTERING OF GRAPHITE IN A HIGH-VACUUM ENVIRONMENT

A method of diamond-like coating deposition on silicon and quartz, tha t can he compatible with growth processes of semiconductor and superco nductor films, is described. These carbon thin films were prepared by pulsed laser sputtering of a graphite target in a high-vacuum (similar to 10(-6) Torr) environment. Investigations by a variety of spectrosc opic techniques demonstrate that the films have a high density (simila r to 2.9 g/cm(3)) close to the density of diamond, a high ratio of sp( 3) to sp(2) bonding (0.75/0.25), and IR transparency. The films were h ard, adhesive to the substrate and had a high resistivity, It was foun d that hydrogen is incorporated into the films up to similar to 10 at% due to reactions of sputtered carbon particles with residual hydrocar bons in the high-vacuum environment.