CARBON NITRIDE - PROSPECTS FOR ULTIMATE PERFORMANCE OF SUPERHARD MATERIALS

Citation
Sa. Uglov et al., CARBON NITRIDE - PROSPECTS FOR ULTIMATE PERFORMANCE OF SUPERHARD MATERIALS, Applied surface science, 92, 1996, pp. 656-659
Citations number
14
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
92
Year of publication
1996
Pages
656 - 659
Database
ISI
SICI code
0169-4332(1996)92:<656:CN-PFU>2.0.ZU;2-1
Abstract
In order to deposit thin solid films containing covalently bonded carb on nitride as a major matrix component, several different techniques f or deposition were explored. They included reactive pulsed laser depos ition, reactive DC magnetron sputtering and laser ablation of a frozen ethanol/liquid N-2 double layer system. Surface analysis techniques s howed that the concentrations of nitrogen were as high as 20 to 25 at% in the bulk and up to 40 at% in the upper layers of the resulting a-C /a-CNx films. The covalent bond of nitrogen to carbon was identified. It is similar to the nitrogen bonds in silicon nitride and boron nitri de.