ELECTRONIC-STRUCTURE OF A BURIED NISI2 OR COSI2 LAYER IN BULK SI

Authors
Citation
Jt. Schick et Sm. Bose, ELECTRONIC-STRUCTURE OF A BURIED NISI2 OR COSI2 LAYER IN BULK SI, Physical review. B, Condensed matter, 53(19), 1996, pp. 12609-12612
Citations number
21
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
53
Issue
19
Year of publication
1996
Pages
12609 - 12612
Database
ISI
SICI code
0163-1829(1996)53:19<12609:EOABNO>2.0.ZU;2-5
Abstract
An empirical tight-binding Green's function model is applied to a sing le layer of nickel disilicide or cobalt disilicide embedded in bulk si licon. The electronic band structure of localized and extended states in the vicinity of the bulk silicon band gap is investigated.