IN-SITU OBSERVATION OF THE C49-TO-C54 PHASE-TRANSFORMATION IN TISI2 THIN-FILMS BY TRANSMISSION ELECTRON-MICROSCOPY

The C49-to-C54 phase transformation of TiSi2 has been studied by in si tu transmission electron microscopy (TEM) in the high resolution mode using cross-sectional samples and by X-ray diffraction (XRD). XRD and TEM analyses suggest that the (131) plane of the C49 phase transforms to the (311) and/or (313) planes of the C54 phase. In Situ TEM observa tion shows that the interface of the transformation moves parallel to the Si substrate, while the direction of the transformation does not d epend on the orientation of the C49 phase. The results indicate that t he transformation occurs via the short-distance diffusion of atoms.