Vg. Golubev et al., STRONG PHOTOINDUCED INCREASE IN THE LUMINESCENCE INTENSITY OF ANODICALLY OXIDIZED POROUS SILICON, Semiconductors, 30(5), 1996, pp. 456-461
A strong nonlinear intensification of photoluminescence upon applicati
on of low-power (<1 W/cm(2)) cw laser excitation (488 nm) at room temp
erature in a freshly prepared, anodically oxidized porous silicon (AOP
S) was detected. The maximum absolute photoluminescence intensity and
its maximum relative change as a function of the irradiation time were
attained in layers of porous silicon with the average degree of oxida
tion. As a result of laser illumination, the intensities of the O-3-Si
H, Si-O-Si, and Si-OH vibrational modes were higher than the intensity
of the SiHn modes in the infrared absorption spectra. The results con
firmed that the structure of the oxide on the surface of the silicon c
rystallites and the structure of Si/SiO2 interface play an important r
ole in the photoluminescence process. (C) 1996 American Institute of P
hysics.