STRONG PHOTOINDUCED INCREASE IN THE LUMINESCENCE INTENSITY OF ANODICALLY OXIDIZED POROUS SILICON

Citation
Vg. Golubev et al., STRONG PHOTOINDUCED INCREASE IN THE LUMINESCENCE INTENSITY OF ANODICALLY OXIDIZED POROUS SILICON, Semiconductors, 30(5), 1996, pp. 456-461
Citations number
33
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
10637826
Volume
30
Issue
5
Year of publication
1996
Pages
456 - 461
Database
ISI
SICI code
1063-7826(1996)30:5<456:SPIITL>2.0.ZU;2-H
Abstract
A strong nonlinear intensification of photoluminescence upon applicati on of low-power (<1 W/cm(2)) cw laser excitation (488 nm) at room temp erature in a freshly prepared, anodically oxidized porous silicon (AOP S) was detected. The maximum absolute photoluminescence intensity and its maximum relative change as a function of the irradiation time were attained in layers of porous silicon with the average degree of oxida tion. As a result of laser illumination, the intensities of the O-3-Si H, Si-O-Si, and Si-OH vibrational modes were higher than the intensity of the SiHn modes in the infrared absorption spectra. The results con firmed that the structure of the oxide on the surface of the silicon c rystallites and the structure of Si/SiO2 interface play an important r ole in the photoluminescence process. (C) 1996 American Institute of P hysics.