Au-Schottky diodes have been fabricated on highly oriented diamond (HO
D) films, grown on silicon using ac-bias nucleation and microwave plas
ma chemical vapor deposition, The active layers were selectively grown
and doped by solid boron source, Nigh rectification ratios were obtai
ned up to 500 degrees C in a bias voltage range up to +/-15 V, A curre
nt density of more than 1 A/cm(2) and a breakdown field strength up to
2.0 . 10(6) V/cm for point contacts has been demonstrated.