S. Saintenoy et al., OBSERVATION OF A TEMPORAL EVOLUTION OF DEFECTED EPITAXIAL ERBIUM SILICIDE LAYERS AT ROOM-TEMPERATURE, Solid state communications, 98(11), 1996, pp. 1015-1019
We present angle-resolved photoemission spectra of the root 3x root 3R
30 degrees ErSi2-x (0001) surface (x similar to 0.3) under ultra-high
vacuum conditions at room temperature. An ordering process in the atom
ic structure of the topmost layers is clearly observed over several ho
urs or days. This change in atomic order is confirmed by low-energy el
ectron diffraction. It is particularly marked for ultra-thin silicide
layers grown by solid phase epitaxy or coevaporation in the 500 degree
s-600 degrees C temperature range. Copyright (C) 1996 Published by Els
evier Science Ltd