STUDY OF THE FORMATION PROCESS OF SI CEO2 STRUCTURE BOUNDARY BY THE X-RAY PHOTOELECTRON-SPECTROSCOPY/

Citation
Ov. Smolskii et al., STUDY OF THE FORMATION PROCESS OF SI CEO2 STRUCTURE BOUNDARY BY THE X-RAY PHOTOELECTRON-SPECTROSCOPY/, Pis'ma v Zurnal tehniceskoj fiziki, 22(3), 1996, pp. 23-28
Citations number
9
Categorie Soggetti
Physics, Applied
ISSN journal
03200116
Volume
22
Issue
3
Year of publication
1996
Pages
23 - 28
Database
ISI
SICI code
0320-0116(1996)22:3<23:SOTFPO>2.0.ZU;2-N