SOME NEW OPTICAL MEASUREMENT TECHNIQUES FOR THE STUDY OF CRYSTAL-GROWTH AND ELECTRODE PROCESSES

Citation
Xl. Yu et al., SOME NEW OPTICAL MEASUREMENT TECHNIQUES FOR THE STUDY OF CRYSTAL-GROWTH AND ELECTRODE PROCESSES, Optics and lasers in engineering, 25(2-3), 1996, pp. 191-204
Citations number
25
Categorie Soggetti
Optics
ISSN journal
01438166
Volume
25
Issue
2-3
Year of publication
1996
Pages
191 - 204
Database
ISI
SICI code
0143-8166(1996)25:2-3<191:SNOMTF>2.0.ZU;2-C
Abstract
This paper discusses some new optical measurement techniques for the s tudy of crystal growth and electrode processes, namely, holographic ph ase-contrast interferometric microphotography (HPCIM), phase conjugati on interferometry (PCI) and laser diffractometry. Using these techniqu es, real-time crystal growth and electrode processes can be observed; solid-liquid interface boundary layers and the crystal surface morphol ogy can be studied quantitatively and solution saturation and crystal growth rates can be measured precisely. These techniques are also comp ared with other methods.