EFFECT OF RAPID THERMAL ANNEALING ON THE PROPERTIES OF THIN CARBON-FILMS

Authors
BESHKOV G VELCHEV N TZENOV N MILENOV T LAZAROVA V
Citation
G. Beshkov et al., EFFECT OF RAPID THERMAL ANNEALING ON THE PROPERTIES OF THIN CARBON-FILMS, Materials science & engineering. B, Solid-state materials for advanced technology, 38(1-2), 1996, pp. 25-28
Citations number
12
Categorie Soggetti
Material Science","Physics, Condensed Matter
Journal title
Materials science & engineering. B, Solid-state materials for advanced technology → ACNP
ISSN journal
09215107
Volume
38
Issue
1-2
Year of publication
1996
Pages
25 - 28
Database
ISI
SICI code
0921-5107(1996)38:1-2<25:EORTAO>2.0.ZU;2-F
Abstract
Carbon films deposited on silicon substrates were studied after rapid thermal annealing (RTA) by Raman spectroscopy and electrical resistanc e measurements. The temperature and duration of RTA are related to the form and shift of the peaks in the Raman spectra and resistance curve of the films.